Preparation and characterization of high-k aluminium oxide thin films by atomic layer deposition for gate dielectric applications (Record no. 76895)

MARC details
000 -LEADER
fixed length control field 00830nam a22001937a 4500
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20121217151358.0
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 121217t xxu||||| |||| 00| 0 eng d
080 ## - UNIVERSAL DECIMAL CLASSIFICATION NUMBER
Universal Decimal Classification number 537.226:539.23
Item number ANU T
100 ## - MAIN ENTRY--PERSONAL NAME
Personal name Anu philip
245 ## - TITLE STATEMENT
Title Preparation and characterization of high-k aluminium oxide thin films by atomic layer deposition for gate dielectric applications
Statement of responsibility, etc Anu Philip; guided by K. Rajeev Kumar
300 ## - PHYSICAL DESCRIPTION
Extent 202p.
653 ## - INDEX TERM--UNCONTROLLED
Uncontrolled term Dielectronics - high K-materials
653 ## - INDEX TERM--UNCONTROLLED
Uncontrolled term Atomic layer deposition of Aluminium oxide thin films
653 ## - INDEX TERM--UNCONTROLLED
Uncontrolled term MOS Capacitors
700 ## - ADDED ENTRY--PERSONAL NAME
Personal name Rajeev Kumar, K; guided by
942 ## - ADDED ENTRY ELEMENTS (KOHA)
item type Theses
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT)
Place of publication, distribution, etc Kochi
Name of publisher, distributor, etc Department of Instrumentations; Cusat
Date of publication, distribution, etc 2011
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT)
-- 22398
Holdings
Lost status Source of classification or shelving scheme Not for loan Home library Current library Shelving location Date acquired Total Checkouts Full call number Barcode Date last seen Price effective from Koha item type
  Universal Decimal Classification Not For Loan University Library University Library Reference 17/12/2012   537.226:539.23 ANU T T0000555 17/12/2012 17/12/2012 Theses
University Library, CUSAT