Microwave plasma assisted ALD development for the deposition of gate oxides and ALD of High-k dielectrics

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Publication details: Department of Instrumentation, CUSAT 2015 KochiDescription: xix, 188pSubject(s):

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Item type	Current library	Call number	Status	Date due	Barcode
Theses	University Library Reference	533.9:666.651 SUB (Browse shelf(Opens below))	Not for loan		T0001012

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