TY  - BOOK
AU  - Anu philip
AU  - Rajeev Kumar, K; guided by
TI  - Preparation and characterization of high-k aluminium oxide thin films by atomic layer deposition for gate dielectric applications
PY  - 2011///
CY  - Kochi
PB  - Department of Instrumentations; Cusat
KW  - Dielectronics - high K-materials
KW  - Atomic layer deposition of Aluminium oxide thin films
KW  - MOS Capacitors
ER  -