Photoresist: materials and processes
Publication details: New York McGraw-Hill INc. 1975 Description: 269pSubject(s):| Item type | Current library | Call number | Status | Date due | Barcode |
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Books
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University Library | 621.383 DEF (Browse shelf(Opens below)) | Available | 00007141 |
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| 621.382:681.7 HAI.2 R Handbook of instrumentation and techniques for semiconductor nanostructure characterization | 621.3-83 ARR Power system quality assessment | 621.383 CAS Handbook of Display Technology | 621.383 DEF Photoresist | 621.38.3 WAL Transistor circuit design | 621.383.4 DCE Optoelectronic sensors | 621.383.4 RIG Introduction to optoelectronic sensors |
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