Chemical vaper deposition, Thermal & plasma deposition of electronic materials
Publication details: New York Van Nostrand reinheld 1995 Description: xii, 292pISBN:- 0-442-01079-6
Item type | Current library | Call number | Status | Date due | Barcode |
---|---|---|---|---|---|
Books | University Library | 621.3.049.77 SIV (Browse shelf(Opens below)) | Available | 00041594 |
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