Microwave plasma assisted ALD development for the deposition of gate oxides and ALD of High-k dielectrics

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Publication details: Department of Instrumentation, CUSAT 2015 KochiDescription: xix, 188pSubject(s):

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Item type	Current library	Call number	Status	Date due	Barcode
Theses	University Library Reference	533.9:666.651 SUB (Browse shelf(Opens below))	Not for loan		T0001012

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Previous	533.92 PRA T Studies on optical and x-ray emission processes in laser produced plasma	533.9:535.374 JOS T Studies on laser induced and RF sputtered plasma using optical emission spectroscopy and langmuir probe	533.9:535.374 SON T Application of imaging to study the evolution and dynamics of laser produced plasma from solid and thin film li targets (Thesis)	533.9:666.651 SUB Microwave plasma assisted ALD development for the deposition of gate oxides and ALD of High-k dielectrics	534(05) ANA.53/1-2 books Analytical chemistry	534(73)(05) JOU.22 Journal of the acoustical society of America	534(73)(05) JOU.23 Journal of the acoustical society of America	Next

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