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		No cover image available Preparation and characterization of high-k aluminium oxide thin films by atomic layer deposition for gate dielectric applications Anu Philip; guided by K. Rajeev Kumar by Anu philip Rajeev Kumar, K; guided by Publication details: Kochi Department of Instrumentations; Cusat 2011 Availability: Items available for reference: University Library : Not For Loan (1)Call number: 537.226:539.23 ANU T. Add to cart (remove)
		No cover image available Microwave plasma assisted ALD development for the deposition of gate oxides and ALD of High-k dielectrics by Subin Thomas Rajeev Kumar, K., guided by Publication details: Kochi Department of Instrumentation, CUSAT 2015 Availability: Items available for reference: University Library : Not for loan (1)Call number: 533.9:666.651 SUB. Add to cart (remove)
		No cover image available Developement of metal and metal oxide nano structures for surface enhanced Raman scattering by Hasna k Rajeev Kumar.K;guided by Jayaraj,M.K;Co-guided by Publication details: Kochi Department of Instrumentation,Cusat 2016 Availability: Items available for reference: University Library : Not for loan (1)Call number: 544.174.5 HAS T. Add to cart (remove)

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