Preparation and characterization of high-k aluminium oxide thin films by atomic layer deposition for gate dielectric applications Anu Philip; guided by K. Rajeev Kumar

By:

Contributor(s):

Publication details: Kochi Department of Instrumentations; Cusat 2011 Description: 202pSubject(s):

Tags from this library: No tags from this library for this title. Log in to add tags.

Holdings
Item type	Current library	Call number	Status	Date due	Barcode
Theses	University Library Reference	537.226:539.23 ANU T (Browse shelf(Opens below))	Not for loan		T0000555

There are no comments on this title.

to post a comment.